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Jiangyin Entret Coating Technology Co., Ltd.

MOS2, Molybdenum Disulfide, Molybdic Sulfide manufacturer / supplier in China, offering Molybdenum Disulfide Sputtering Target, MOS2 Target, Good Quality for Tantalum Sputtering Target, MOS2 Target for Sputtering and so on.

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Supplier Homepage Product Disk Shape Sputtering targets Molybdenum Disulfide Sputtering Target, MOS2 Target

Molybdenum Disulfide Sputtering Target, MOS2 Target

FOB Price: US $150 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $150/ Piece
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Port: Jiangyin, China
Production Capacity: 1000PC Per Year
Payment Terms: L/C, T/T

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Basic Info
  • Model NO.: ETT-16100906
  • Size: According to The Customer′s Requirements
  • Standard: ASTM
  • Alloy: Non-alloy
  • Trademark: ETT
  • Specification: SGS
  • HS Code: 8486909100
  • Type: Sputtering Target
  • Application: Aviation, Industrial
  • Purity: >99.5%
  • Powder: Not Powder
  • Transport Package: Standard Packing
  • Origin: China
Product Description

Entret Coating Technology Co.,LTD ,located in the yangtze river delta --Jiangyin ,China,is a professional high-tech company dedicated to manufacturing various sputtering targets and plasma equipments .
Molybdenum Disulfide Sputtering Target, MOS2 Target

Our R&D team consists of PHD and masters who are very expert on the sputtering targets and manufacturing the Plasma technology and equipment .By using the advanced technology from America and Europe ,and cooperating with well-known R&D institutions ,we have successfully produced various high-quality sputtering targets and high-performance plasma coating system with independent intelligent property right .Our products are favored by domestic and abroad customers .

The common attribute across the entire company is the relentless and tireless pursuit of quality and customer satisfaction, both in the products and the services we provide worldwide. ETT takes this responsibility seriously, working at all levels to ensure high quality performance in all our products.
Molybdenum Disulfide Sputtering Target, MOS2 Target

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