MGO Sputtering Target for Sale Magnesium Oxide Target pictures & photos

MGO Sputtering Target for Sale Magnesium Oxide Target

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Min. Order / Reference FOB Price
1 Piece	US $30-50/ Piece

Port:	Jiangyin, China
Production Capacity:	10000PC Per Year
Payment Terms:	T/T, Paypal

Classification:	Magnesium Oxide
Grade Standard:	Industrial Grade
Kind:	Sputtering Target
Quality:	First Class
Material:	Please Ask to Know More
Transport Package:	Inside Bag Vacuum Sealed

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Basic Info

Trademark: ETT

Specification: according to customer′s requirements

Origin: China

HS Code: 8486909900

Product Description

Sputtering Target

Ceramic Sputtering Target

Material	Purity	Maximum Size	Note
Al2O3	4N	Dia80*8mm	Density>80%
BaTiO3	4N	Dia80*8mm	Density>80%
BaxSr(1-x)TiOy	4N	Dia80*8mm	Density>80%
BaZrO3	4N	Dia80*8mm	Density>80%
Bi2FeCrO6	3.5N	Dia80*8mm	Density>80%
CeO2	4N	Dia80*8mm	Density>80%
NiFeO2	3.5N	Dia80*8mm	Density>80%
MgO	4N	Dia80*8mm	Density>80%
PZT	4N	Dia80*8mm	Density>80%
PbZrO3	4N	Dia80*8mm	Density>80%
SrTiO3	4N	Dia80*8mm	Density>80%
SrZrO3	4N	Dia80*8mm	Density>80%
LaSrCoOx	4N	Dia80*8mm	Density>80%
LaSrNiOx	4N	Dia80*8mm	Density>80%
YBCO	4N	Dia80*8mm	Density>80%
TiO2	4N	Dia80*8mm	Density>80%
Al:ZnO	4N	Dia80*8mm	Density>80%
ZrO	4N	Dia80*8mm	Density>80%

Monocrystal Sputtering Target

Material	Purity	Maximum Size	Note
Al2O3	4N	Dia3"
MgO	4N	Dia2"
Ge	5N	Dia4"
SrTiO3	5N	Dia 30
Si	5N	Dia4"
SiO2	5N	Dia4"
LaAlO3	4N	Dia2"

Metal Sputtering Target

Material	Purity	Maximum Size	Manufacturing Technology
Al	3~5N	1000*300mm	Melting
Ag	4N	1000*300mm	Melting
Au	4N	800*300mm	Melting
Bi	4N	400*200mm	Melting
C	3N	600*300mm	Special Sintering
Co	3N	800*300mm	Melting
Cr	2N5~3N5	500*200mm	Special Sintering
Cu	3N7	1000*300mm	Melting
Fe	2N5,3N,4N	1000*300mm	Melting
Ge	4N	Dia4"
Hf	3N	500*200mm	Melting
In	4N	800*300mm	Melting
Mg	3N5	500*300mm	Melting
Mo	3N5	500*300mm	Special Sintering
Ni	2N5,3N5,4N5	1000*300mm	Melting
Pb	3N,4N	800*300mm	Melting
Pd	3N	500*300mm	Melting
Si	5N	Dia4"	Special Sintering
Sn	3N5,5N	1000*300mm	Melting
Ta	3N5	1000*300mm	Melting
Ti	2N5,3N	1000*300mm	Melting
V	2N5,3N	1000*300mm	Melting
W	3N5	1000*300mm	Melting
Zn	3N,4N	800*300mm	Melting
Zr	3N	800*300mm	Melting

Alloy Sputtering Target

Material	Purity	Maximum Size	Manufacturing Technology
Al-Cu	4N~5N	1000*300mm	Melting
Al-Ti	4N	1000*300mm	Melting
Al-Mg	4N	1000*300mm	Melting
Ag-Cu	4N	1000*300mm	Melting
Co-Cr	3N	400*300mm	Melting
Co-Ni	3N	400*300mm	Melting
Co-Fe	3N	400*300mm	Melting
Co-Fe-Cu	3N	400*300mm	Melting
Cu-Al	3N~4N	400*300mm	Melting
Fe-Mn	2N5	400*300mm	Melting
Fe-Ni	2N5~3N5	400*300mm	Melting
Ni-Cr	3N~3N5	1000*300mm	Melting
Ni-Cr-Fe	3N	500*300mm	Melting
Ni-Fe	3N~3N5	600*300mm	Melting
Ni-Al	3N~3N5	400*200mm	Melting
Ti-Al	3N~3N5	400*200mm	Special Sintering
Ti-Ni	3N~3N5	400*200mm	Melting
Zn-Al	3N~3N5	400*200mm	Melting

MGO Sputtering Target for Sale Magnesium Oxide Target

Our booth at 2016SVC Techcon ,Indianapolis ,USA.

Entret Coating Technology Co.,LTD ,located in the yangtze river delta -- Jiangyin ,China,is a professional high-tech company dedicated to manufacturing various sputtering targets and plasma equipments .
Our R&D team consists of PHD and masters who are very expert on the sputtering targets and manufacturing the Plasma technology and equipment .

By using the advanced technology from America and Europe ,and cooperating with well-known R&D institutions ,we have successfully produced various high-quality sputtering targets and high-performance plasma coating system with independent intelligent property right .

Our products are favored by domestic and abroad customers .The common attribute across the entire company is the relentless and tireless pursuit of quality and customer satisfaction, both in the products and the services we provide worldwide.ETT takes this responsibility seriously, working at all levels to ensure high quality performance in all our products.
MGO Sputtering Target for Sale Magnesium Oxide Target