Jiangsu, China
Business Type:
Manufacturer/Factory & Trading Company
Management System Certification:
ISO 9000
Terms of Payment:
LC, T/T, Western Union
OEM/ODM Service
Sample Available
MEI Awards

Sputtering Target, Graphite Target, Carbon Target manufacturer / supplier in China, offering High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%, Orientation Silicon Wafer Substrate Oriented Silicon Wafer, High Quality Sputtering Target Supplier in China and so on.

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Supplier Homepage Products Disk Shape Sputtering targets High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%

High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%

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Min. Order / Reference FOB Price
1 Piece US $50/ Piece
Port: Jiangyin, China
Production Capacity: 1000PC Per Year
Payment Terms: T/T, Western Union, Paypal
Artificial Graphite Type: Special Graphite Class
Active Carbon Material: Asked
Carbon Content: High-Carbon
Pore Diameter: Asked
Manufacturing Method: Asked
Type: Asked

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Basic Info

Model NO.: ETT-110201
Appearance: Grey
Usage: Chemical Industry
Physical Properties: Asked
Chemical Properties: Asked
Adsorption Properties: Asked
Size: Dia50mm,According to Customer′s Requirements
Trademark: ETT
Transport Package: Standard Package
Specification: SGS
Origin: China
HS Code: 8486909100

Product Description

High Purity Graphite Carbon Sputtering Target
High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%
ItemMeasured valueUnit
Jiangyin Entret Coating Technology Co.,Ltd(ETT), as a hi-tech company, mainly supplies sputtering targets and advanced materials to industrial field and lab worldwide for many years. ETT is a professional manufacturer engaged in the research,development, production, sale and others of sputtering targets, evaporation materials, substrate wafers, semiconductors, highly pure materials, rare earth materials and inorganic chemical compounds.
ETT has lots of advanced techniques to produce materials based on raw materials. The detailed methods are as below: hot pressing (HP), cold isostatic pressing(CIP), cold pressing and sinter, vacuum induction melting (VIM), vacuum induced levitation melting furnace vacuum sintering, vacuum melting casting, vacuum arc melting, vacuum sinter, FZ, CZ, CVD, Vacuum forging and so on. ETT has a strong and experienced R&D team. ETT can design and produce according to your orders.
ETT has a strict system on quality control and production in the whole process like raw-material selection, production and finished product testing.
ETT can supply sputtering target and many finished products (including plate, disk, wire, rod, sheet, foil, circle, tube, table,screw, nut, boat and others). You can contact us while you have the demands for these products. The best quality and competitive quotation will meet your demands. We are looking forward to receiving your inquiries!
High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%

High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%

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