Jiangsu, China
Business Type:
Manufacturer/Factory & Trading Company
Management System Certification:
ISO 9000
Terms of Payment:
LC, T/T, Western Union
OEM/ODM Service
Sample Available
MEI Awards

Rotary Target, Silicon, Silicon Aluminum manufacturer / supplier in China, offering Silicon Aluminum Rotary Sputtering Target (high quality sputtering target), Nickel Target for Sputtering, Carbon Sputtering Target of High Quality for Sale and so on.

Gold Member Since 2015
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Supplier Homepage Products Ceramic Sputtering target si-al target Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)
  • Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)
  • Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)
  • Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)
  • Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)
  • Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)
  • Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)

Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)

Get Latest Price
Min. Order / Reference FOB Price
2 Pieces US $200-300/ Piece
Port: Shanghai, China
Production Capacity: 100000PCS /Per Year
Payment Terms: L/C, T/T, Western Union, Paypal
Shape: Rotary
Target Dimension: Length(Max)4000mm
Carbon Content: Low Carbon
Product Type: Sputtering Target
Material: Sial
PCD: Asked

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Basic Info

Model NO.: ETT-159211
Et: Asked
Hole: Asked
Trademark: ETT
Transport Package: Export Wooden Box, One PC Per Wooden Carton
Specification: SGS
Origin: Jiangsu Jiangyin
HS Code: 7604299000

Product Description

SiAl (Silicon & Aluminum ) Rotary Sputtering Target
1.Detail:
 
ContentSi: 90 wt% ,Al:10  wt%
Purity≥99.95%
Relative Density≥96%
Resistivity≤10mΩ·cm
Specificationlength(max)4000mm*thickness(max)13mm; linearity:05.mm
Processing ModePlasma spraying 
ApplicationLow emission glass
Delivery time2 weeks  after receipt of deposit

2.Why Us :
 
High purity99.9%
Uniform compositionelement Deviation Index ±2wt%
Smaller grain<100μm
High density
2.251g/cm
Low resitivity7 mΩ·cm


3: Our Target
Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)
Impurity Content:

Fe<=0.03%   Cd<=0.0005%    Pb<=0.0005%    As<=0.0002%
Mn<=0.001%  Cu<=0.0005%    K<=0.001%      Ca<=0.001%

Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)
FAQ--Please feel free to contact us ...
Silicon Aluminum Rotary Sputtering Target (high quality sputtering target)

 

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