Jiangsu, China
Business Type:
Manufacturer/Factory & Trading Company
Management System Certification:
ISO 9000
Terms of Payment:
LC, T/T, Western Union
OEM/ODM Service
Sample Available
MEI Awards

Rotary Target, Silicon, Silicon Aluminum manufacturer / supplier in China, offering Sial (Silicon & Aluminum) Rotatable Sputtering Target, Orientation Silicon Wafer Substrate Oriented Silicon Wafer, High Quality Sputtering Target Supplier in China and so on.

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  • Sial (Silicon & Aluminum) Rotatable Sputtering Target

Sial (Silicon & Aluminum) Rotatable Sputtering Target

Get Latest Price
Min. Order / Reference FOB Price
2 Pieces US $200-300/ Piece
Port: Shanghai, China
Production Capacity: 100000PCS /Per Year
Payment Terms: L/C, T/T, Western Union, Paypal
Target Dimension: Length(Max)4000mm
Carbon Content: Low Carbon
Product Type: Sputtering Target
Material: Sial
PCD: Asked
ET: Asked

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Basic Info

Model NO.: ETT-16061901
Hole: Asked
Trademark: ETT
Transport Package: Export Wooden Box, One PC Per Wooden Carton
Specification: SGS
Origin: Jiangsu Jiangyin
HS Code: 7604299000

Product Description

SiAl (Silicon & Aluminum ) Rotary Sputtering Target
ContentSi: 90 wt% ,Al:10  wt%
Relative Density≥96%
Specificationlength(max)4000mm*thickness(max)13mm; linearity:05.mm
Processing ModePlasma spraying 
ApplicationLow emission glass
Delivery time2 weeks  after receipt of deposit

2.Why Us :
High purity99.9%
Uniform compositionelement Deviation Index ±2wt%
Smaller grain<100μm
High density
Low resitivity7 mΩ·cm

3: Our Target
Sial (Silicon & Aluminum) Rotatable Sputtering Target

4:Packing :

According to customers' request.


Sial (Silicon & Aluminum) Rotatable Sputtering Target
5:Impurity Content:

Fe<=0.03%   Cd<=0.0005%    Pb<=0.0005%    As<=0.0002%
Mn<=0.001%  Cu<=0.0005%    K<=0.001%      Ca<=0.001%

6.Independent intelligent property right

We have obtained 11 independent intelligrnt property rights about sputtering targets and plasma spraying equipments .
Sial (Silicon & Aluminum) Rotatable Sputtering Target

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