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Jiangyin Entret Coating Technology Co., Ltd.

Rotary Target, Rotatable Target, Silicon Aluminum manufacturer / supplier in China, offering Si-Al Sputtering Targets at Purity Ranges From 99.9% to 99.999%, ITO/Cu Sputtering Target, In2o3/Sno2 (90/10wt%) Target of High Quality for Coating, Zirconium Sputtering Target of High Quality and High Purity for Coating and so on.

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Supplier Homepage Product Ceramic Sputtering target si-al target Si-Al Sputtering Targets at Purity Ranges From 99.9% to 99.999%

Si-Al Sputtering Targets at Purity Ranges From 99.9% to 99.999%

Purchase Qty.:
(Pieces)
1-4 5+
FOB Unit Price: US $50 US $20
Purchase Qty. (Pieces) FOB Unit Price
1-4 US $50
5+ US $20
Get Latest Price
Port: Jiangyin, China
Production Capacity: 100000PCS /Per Year
Payment Terms: L/C, T/T, Western Union

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Rotatable sputtering target
50 Products
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Basic Info
  • Model NO.: ETT-1510151
  • Application: Low Emission Glass
  • Grade: High Quality
  • Technique: Plasma Spraying
  • Certification: GB/T
  • Trademark: ETT
  • Specification: SGS
  • HS Code: 8486909100
  • Type: Silicon Aluminum
  • Shape: Rotary
  • Surface Treatment: Polished
  • Alloy: Non-alloy
  • Target Dimension: Length(Max)4000mm
  • Transport Package: Export Wooden Box, One PC Per Wooden Carton
  • Origin: Jiangsu Jiangyin
Product Description
SiAl (Silicon & Aluminum ) Rotary Sputtering Target
1.Detail:
 
ContentSi: 90 wt% ,Al:10  wt%
Purity≥99.95%
Relative Density≥96%
Resistivity≤10mΩ·cm
Specificationlength(max)4000mm*thickness(max)13mm; linearity:05.mm
Processing ModePlasma spraying 
ApplicationLow emission glass
Delivery time2 weeks  after receipt of deposit

2.Why Us :
 
High purity99.9%
Uniform compositionelement Deviation Index ±2wt%
Smaller grain<100μm
High density
2.251g/cm
Low resitivity7 mΩ·cm


3: Production Workflow Chart 
Si-Al Sputtering Targets at Purity Ranges From 99.9% to 99.999%




4:Packing :

According to customers' request.


 

Si-Al Sputtering Targets at Purity Ranges From 99.9% to 99.999%
5:Impurity Content:

Fe<=0.03%   Cd<=0.0005%    Pb<=0.0005%    As<=0.0002%
Mn<=0.001%  Cu<=0.0005%    K<=0.001%      Ca<=0.001%

6.Independent intelligent property right

We have obtained 11 independent intelligrnt property rights about sputtering targets and plasma spraying equipments .
Si-Al Sputtering Targets at Purity Ranges From 99.9% to 99.999%

 
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