Gold Member Since 2015
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Jiangyin Entret Coating Technology Co., Ltd.

Sputtering Target, Graphite Target, Carbon Target manufacturer / supplier in China, offering High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%, ITO/Cu Sputtering Target, In2o3/Sno2 (90/10wt%) Target of High Quality for Coating, Zirconium Sputtering Target of High Quality and High Purity for Coating and so on.

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Supplier Homepage Product Disk Shape Sputtering targets High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%

High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%

FOB Price: US $50 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $50/ Piece
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Port: Jiangyin, China
Production Capacity: 1000PC Per Year
Payment Terms: T/T, Western Union, Paypal

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Basic Info
  • Model NO.: ETT-110201
  • Active Carbon Material: Asked
  • Pore Diameter: Asked
  • Type: Asked
  • Usage: Chemical Industry
  • Chemical Properties: Asked
  • Size: Dia50mm,According to Customer′s Requirements
  • Transport Package: Standard Package
  • Origin: China
  • Artificial Graphite Type: Special Graphite Class
  • Carbon Content: High-Carbon
  • Manufacturing Method: Asked
  • Appearance: Grey
  • Physical Properties: Asked
  • Adsorption Properties: Asked
  • Trademark: ETT
  • Specification: SGS
  • HS Code: 8486909100
Product Description
High Purity Graphite Carbon Sputtering Target
High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%
ItemMeasured valueUnit
CMatrixppm
S9ppm
Cr7ppm
Fe11ppm
As3ppm
Pd11ppm
Hg3ppm
Jiangyin Entret Coating Technology Co.,Ltd(ETT), as a hi-tech company, mainly supplies sputtering targets and advanced materials to industrial field and lab worldwide for many years. ETT is a professional manufacturer engaged in the research,development, production, sale and others of sputtering targets, evaporation materials, substrate wafers, semiconductors, highly pure materials, rare earth materials and inorganic chemical compounds.
ETT has lots of advanced techniques to produce materials based on raw materials. The detailed methods are as below: hot pressing (HP), cold isostatic pressing(CIP), cold pressing and sinter, vacuum induction melting (VIM), vacuum induced levitation melting furnace vacuum sintering, vacuum melting casting, vacuum arc melting, vacuum sinter, FZ, CZ, CVD, Vacuum forging and so on. ETT has a strong and experienced R&D team. ETT can design and produce according to your orders.
ETT has a strict system on quality control and production in the whole process like raw-material selection, production and finished product testing.
ETT can supply sputtering target and many finished products (including plate, disk, wire, rod, sheet, foil, circle, tube, table,screw, nut, boat and others). You can contact us while you have the demands for these products. The best quality and competitive quotation will meet your demands. We are looking forward to receiving your inquiries!
High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%

High Purity Graphite Carbon Sputtering Target 99.99% ~ 99.995%
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