Gold Member Since 2015
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Jiangyin Entret Coating Technology Co., Ltd.

Sputtering Target, Silicon Target, Silicon manufacturer / supplier in China, offering High Quality Silicon Sputtering Target, ITO/Cu Sputtering Target, In2o3/Sno2 (90/10wt%) Target of High Quality for Coating, Zirconium Sputtering Target of High Quality and High Purity for Coating and so on.

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High Quality Silicon Sputtering Target

FOB Price: US $50 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $50/ Piece
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Port: Jiangyin, China
Production Capacity: 1000PC Per Year
Payment Terms: T/T, Western Union, Paypal

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Basic Info
  • Model NO.: ETT-0832
  • Trademark: ETT
  • Specification: SGS
  • HS Code: 8486909100
  • Size: Dia50mm,According to Customer′s Requirements
  • Transport Package: Standard Package
  • Origin: China
Product Description
Silicon sputtering target
 
Certificate of Analysis
 
ElementMeasured ValueUnit ElementMeasured ValueUnit ElementMeasured ValueUnit
SiMatrixWt%Zn0.056ppmPb<0.005ppm
Li0.019ppmGa<0.005ppmBi<0.005ppm
B3.11ppmGe0.046ppmY<0.005ppm
F0.18ppmAs0.058ppmTh<0.005ppm
Na0.049ppmSe0.4ppmEr<0.005ppm
Mg<0.005ppmZr<0.005ppmRu<0.005ppm
Al0.018ppmNb<0.005ppmRh<0.005ppm
P0.056ppmMo<0.005ppmOs<0.005ppm
Cl<0.5ppmPd<0.005ppmCs0.008ppm
k0.078ppmAg0.019ppmCd0.027ppm
Ca0.047ppmSn<0.005ppmLa<0.005ppm
Ti<0.005ppmSb0.24ppmCe<0.005ppm
V<0.005ppmBa<0.005ppmPr0.007ppm
Cr<0.005ppmHf<0.005ppmNd<0.005ppm
Mn<0.005ppmTa0.053ppmSm0.041ppm
Fe<0.005ppmW1.16ppmEu0.011ppm
Co<0.005ppmPt<0.005ppmGd<0.005ppm
Ni<0.005ppmAu0.019ppmTb<0.005ppm
Cu0.26ppmHg0.27ppmRe0.02ppm
Be<0.005ppmSc<0.005ppmU<0.005ppm
Br0.033ppmRb0.005ppmRe0.02ppm
Sr<0.005ppmIn0.021ppmS<0.5ppm
Te<0.005ppmI<0.005ppm 
Dy<0.005ppmHo0.007ppm
Tm<0.005ppmYb<0.005ppm
Lu<0.005ppmIR0.01ppm
Jiangyin Entret Coating Technology Co.,Ltd(ETT), as a hi-tech company, mainly supplies sputtering targets and advanced materials to industrial field and lab worldwide for many years. ETT is a professional manufacturer engaged in the research,development, production, sale and others of sputtering targets, evaporation materials, substrate wafers, semiconductors, highly pure materials, rare earth materials and inorganic chemical compounds.
ETT has lots of advanced techniques to produce materials based on raw materials. The detailed methods are as below: hot pressing (HP), cold isostatic pressing(CIP), cold pressing and sinter, vacuum induction melting (VIM), vacuum induced levitation melting furnace vacuum sintering, vacuum melting casting, vacuum arc melting, vacuum sinter, FZ, CZ, CVD, Vacuum forging and so on. ETT has a strong and experienced R&D team. ETT can design and produce according to your orders.
ETT has a strict system on quality control and production in the whole process like raw-material selection, production and finished product testing.
ETT can supply sputtering target and many finished products (including plate, disk, wire, rod, sheet, foil, circle, tube, table,screw, nut, boat and others). You can contact us while you have the demands for these products. The best quality and competitive quotation will meet your demands. We are looking forward to receiving your inquiries!
High Quality Silicon Sputtering Target
Our Products :

Metal (include Rare Earth Metal) :
Al, Sb, Bi, B, CD, C, Ce, Cr, Co, Cu, Dy, Er, Eu, Gd, Ge, Au, C, Hf, Ho, In, Ir, Fe, La, Lu, Mg, Mn, Mo, Nd, Ni, Nb,
Pd, Pt, Pr,Re, Ru, Sm, Se, Sc, Ag, SI, Ta, Tb, Tm, Sn, Ti, W, V, Yb, Y, Zr, Zn, La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Ho,
Er, Tm, Yb, Lu, Sc,Y
Alloy:
AlCu, AlCr, AlMg, AlSi, AlSiCu, AlAg, AlV, CaNiCrFe, CaNiCrFeMoMn, CeGd, CeSm, CrSi, CoCr, CoCrMo, CoFe,
CoFeB, CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo, CuGa, CuIn, CuNi, CoNiPt, CuZr,
DyFe,DyFeCo, FeB, FeC, FeMn, GdFe, GdFeCo, HfFe, IrMn, IrRe, InSn, MoSi, NiAl, NiCr, NiCrSi, NdDyFeCo,
NiFe, NiMn, NiNbTi,NiTi, NiV, SmCo, AgCu, AgSn, TaAl, TbDyFe, TbFe, TbFeCo, TbGdFeCo, TiAl, TiNi, TiCr,
WRe, WTi, WCu, ZrAl, ZrCu, ZrFe,ZrNb, ZrNi, ZrTi, ZrY, ZnAl, ZnMg
Boride :
Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2, LaB6, Mo2B, Mo2B5, NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2,
ZrB2
Carbide:
B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, TiC, WC, W2C, VC, ZrC
Fluoride:
AlF3, BaF3, CdF2, CaF2, CeF3, DyF3, ErF3, HfF4, KF, LaF3, PbF2, LiF, PrF3, MgF2, NdF3, ReF3, SmF3, NaF,
Cryolite, Na3AlF6, SrF2, ThF4, YF3, YbF3
Nitrides:
AlN, BN, GaN, HfN, NbN, Si3N4, TaN, TiN, VN, ZrN
Oxide:
Al2O3, Sb2O3, ATO, BaTiO3, Bi2O3, CeO2, CuO, Cr2O3, Dy2O3, Er2O3, Eu2O3, Gd2O3, Ga2O3, GeO2,
HfO2,Ho2O3, In2O3, ITO, Fe2O3, Fe3O4, La2O3, PbTiO3, PbZrO3, LiNbO3, Lu3Fe5O12, Lu2O3, MgO, MoO3,
Nd2O3, Pr6O11, Pr,(TiO2) 2, Pr2O3, Sm2O3, Sc2O3, SiO2, SiO, SrTiO3, SrZrO3, Ta2O5, Tb4O7, TeO2, ThO2,
Tm2O3, TiO2, TiO, Ti3O5, Ti2O3,SnO2, SnO, WO3, V2O5, YAG, Y3Al5O12, Yb2O3, Y2O3, ZnO, ZnO: Al, ZrO2
(unstabilized) , ZrO2-5-15wt% CaO)
Selenides:
Bi2Se3, CdSe, In2Se3, PbSe, MoSe2, NbSe2, TaSe2, WSe2, ZnSe
Silicides:
Cr3Si, CrSi2, CoSi2, HfSi2, MoSi2, NbSi2, TaSi2, Ta5Si3, TiSi2, Ti5Si3, WSi2, V3Si, VSi2, ZrSi2
Sulfides:
Sb2S3, As2S3, CdS, FeS, PbS, MoS2, NbS1. 75, TaS2, WS2, ZnS,
Te
llurides:
CdTe, PbTe, MoTe2, NbTe2, TaTe2, WTe2, ZnTe
Other:
Cr-SiO, GaAs, Ga-P, In-Sb, InAs, InP, InSn

High Quality Silicon Sputtering Target
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