Gold Member Since 2015
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Jiangyin Entret Coating Technology Co., Ltd.

Rotary Target, Silicon, Silicon Aluminum manufacturer / supplier in China, offering Sial (Silicon & Aluminum) Rotatable Sputtering Target, High Purity for MOS2 Sputtering Target of High Quality, Silver Sputtering Target of High Purity and Quality and so on.

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Supplier Homepage Product Ceramic Sputtering target si-al target Sial (Silicon & Aluminum) Rotatable Sputtering Target

Sial (Silicon & Aluminum) Rotatable Sputtering Target

FOB Price: US $200-300 / Piece
Min. Order: 2 Pieces
Min. Order FOB Price
2 Pieces US $200-300/ Piece
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Port: Shanghai, China
Production Capacity: 100000PCS /Per Year
Payment Terms: L/C, T/T, Western Union, Paypal

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Basic Info
  • Model NO.: ETT-16061901
  • Material: Sial
  • PCD: Asked
  • Hole: Asked
  • Trademark: ETT
  • Specification: SGS
  • HS Code: 7604299000
  • Product Type: Sputtering Target
  • Carbon Content: Low Carbon
  • ET: Asked
  • Target Dimension: Length(Max)4000mm
  • Transport Package: Export Wooden Box, One PC Per Wooden Carton
  • Origin: Jiangsu Jiangyin
Product Description
SiAl (Silicon & Aluminum ) Rotary Sputtering Target
1.Detail:
 
ContentSi: 90 wt% ,Al:10  wt%
Purity≥99.95%
Relative Density≥96%
Resistivity≤10mΩ·cm
Specificationlength(max)4000mm*thickness(max)13mm; linearity:05.mm
Processing ModePlasma spraying 
ApplicationLow emission glass
Delivery time2 weeks  after receipt of deposit

2.Why Us :
 
High purity99.9%
Uniform compositionelement Deviation Index ±2wt%
Smaller grain<100μm
High density
2.251g/cm
Low resitivity7 mΩ·cm


3: Our Target
Sial (Silicon & Aluminum) Rotatable Sputtering Target




4:Packing :

According to customers' request.


 

Sial (Silicon & Aluminum) Rotatable Sputtering Target
5:Impurity Content:

Fe<=0.03%   Cd<=0.0005%    Pb<=0.0005%    As<=0.0002%
Mn<=0.001%  Cu<=0.0005%    K<=0.001%      Ca<=0.001%

6.Independent intelligent property right

We have obtained 11 independent intelligrnt property rights about sputtering targets and plasma spraying equipments .
Sial (Silicon & Aluminum) Rotatable Sputtering Target
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