Gold Member Since 2015
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Jiangyin Entret Coating Technology Co., Ltd.

Sputtering Target, Sputtering, Target manufacturer / supplier in China, offering Silicon (Si) Sputtering Target, Plasma Spray, 99.9% Purity Co2feal Sputtering Target of High Quality, 99.95% Purity for Tungsten Target of High Quality and so on.

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Supplier Homepage Product Ceramic Sputtering target silicon sputtering target Silicon (Si) Sputtering Target, Plasma Spray

Silicon (Si) Sputtering Target, Plasma Spray

FOB Price: US $100 / Piece
Min. Order: 1 Piece
Min. Order FOB Price
1 Piece US $100/ Piece
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Production Capacity: 10000PCS /Per Year
Transport Package: Export Wooden Box, One PC Per Wooden Carton
Payment Terms: L/C, T/T, Western Union

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Rotatable sputtering target
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Basic Info
  • Model NO.: ETT-160304099f
  • Target Dimension: Length(Max)4000mm
  • Specification: SGS
  • HS Code: 28046900
  • Classification: Silicon
  • Trademark: ETT
  • Origin: Jiangsu Jiangyin
Product Description
Si (Silicon) Rotary Sputtering Target
1.Detail:
Silicon (Si) Sputtering Target, Plasma Spray


 
ContentSilicon
Purity≥99.99%
Relative Density≥96%
Resistivity≤8Ω·cm
Specificationlength(max)4000mm*thickness(max)13mm
Processing ModePlasma spraying 
ApplicationFlat panel display
Delivery time10days after receipt of deposit

2.Why Us :
 
High purity99.99%
Smaller grain<100μm
 density
2.12g/cm
Low resitivity10Ω·cm 


3:Packing :

According to customers' request.
Silicon (Si) Sputtering Target, Plasma Spray



 
4:Impurity Content:
 
Fe<=0.001%   Cd<=0.0002%    Pb<=0.0002%    As<=0.0002%
Mn<=0.0005%  Cu<=0.0005%    K<=0.001%      Ca<=0.0003%
 

5.Independent intelligent property right

We have obtained 11 independent intelligrnt property rights about sputtering targets and plasma spraying equipments 
Silicon (Si) Sputtering Target, Plasma Spray
 
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